Our Services

We have a range of state-of the-art equipment available to progress your research.

SUSS Mask and Bond Aligner MA/BA8 GEN4

The MA/BA Gen4 MA/BA8 delivers exceptional process results through its advanced automation. Features such as constant dose mode, an automated exposure time control unit and auto-alignment optimise process parameters for enhanced precision. Equipped with the high-performance MO Exposure Optics system, it ensures ideal exposure conditions for superior outcomes. Additionally, its sophisticated mechanical design enhances adjustment accuracy, with a specially engineered top- and bottom-side microscope unit (TSA and BSA) that minimises TSA microscope travel and reduces vibrations for improved stability.  Our system is equipped with the TSA option.  

Wafer size: 1'', 2'', 6'', 8''

Park AFM NX20  

AFM Mode:  
Electrostatic Force Microscopy  
Kelvin Probe Force Microscopy  
Piezoresponse Force Microscopy   
Magnetic Force Microscopy  
Non-contact Mode  
Tapping Mode

The Park AFM NX20 is a high-resolution atomic force microscope (AFM) designed for precise nanoscale imaging and analysis. It features advanced non-contact mode technology, automated operation and low-noise performance, making it ideal for materials science, nanotechnology and life sciences research.  

Sample size: Up to 200 mm (8 inches)

Aixtron CCS2D MOCVD (awaiting commission)

Model: CCS2D 19X2''

The Aixtron CCS2D MOCVD is a state-of-the-art metal-organic chemical vapour deposition system designed for wafer-scale growth of 2D materials and heterostructures. Featuring precise control over deposition parameters and compatibility, it enables high-quality, reproducible epitaxial films for advanced research and pilot-line production. Its unique close-coupled showerhead design ensures uniform gas distribution, making it ideal for synthesising materials like transition metal dichalcogenides on substrates such as silicon and sapphire.