The Layered Materials Research Foundry (LMRF), a collaborative initiative between the Cambridge Graphene Centre (CGC) at the University of Cambridge and the Optoelectronics Research Centre (ORC) at the University of Southampton, is pleased to announce the installation and commissioning of a new SUSS MicroTec Mask Aligner at CGC’s Class 100 cleanroom.
This state-of-the-art mask aligner is specifically tailored to support the fabrication of large-area contacts and interconnections essential for liquid metal-based (LM-based) optoelectronic devices and other advanced layered materials technologies.
With alignment accuracy below 1 μm, the system provides high-precision mask-to-wafer and wafer-to-wafer operations. It complements CGC’s existing e-beam lithography capabilities from the Royce Institute, offering researchers a robust and flexible lithography platform.
Professor Andrea Ferrari, Director of the Cambridge Graphene Centre, commented:
“The integration of the SUSS MicroTec Mask Aligner into LMRF facilities is a key step in scaling up our fabrication processes from laboratory research to device prototyping. This expands our ability to support both academic and industrial collaborators working at the forefront of optoelectronics, quantum technologies, and layered materials research.”
LMRF’s mission is to provide cutting-edge facilities and expertise for layered materials research, bridging fundamental science and real-world applications in photonics, electronics, and quantum technologies.
With the addition of this high-precision lithography equipment, LMRF strengthens its role as a leading UK and international hub for next-generation materials research and device development.
